Blank Cover Image

Application of scatterometry to shallow trench isolation monitoring

著者名:
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
1024
終了ページ:
1032
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.2
資料種別:
国際会議録

類似資料:

1 国際会議録 Optimization of scatterometry parameters for shallow trench isolation (STI) monitor

Leray, P.J., Cheng, S., Kremer, S., Ercken, M., Pollentier, I.

SPIE - The International Society of Optical Engineering
7 国際会議録 AVOIDING FURNACE SLIP IN THE ERA OF SHALLOW TRENCH ISOLATION

Stephens, A.E.

Electrochemical Society
2 国際会議録 Scatterometry for shallow trench isolation (STI) process metrology

Raymond,C.J., Littau,M.E., Markle,R.J., Purdy,M.A.

SPIE-The International Society for Optical Engineering
8 国際会議録 AVOIDING FURNACE SLIP IN THE ERA OF SHALLOW TRENCH ISOLATION

Stephens, A.E.

Electrochemical Society
3 国際会議録 Improved shallow trench isolation and gate process control using scatterometry based metrology

SPIE - The International Society of Optical Engineering
9 国際会議録 A Silicon Nitride Based Shallow Trench Isolation with Side-Gate for CMOS Integration with MEMS Components for System-On-Chip Applications

Gokirmak, Ali, Tiwari, Sandip

Materials Research Society
4 国際会議録 Recursive least squares estimation and its application to shallow trench isolation

Wang, J., Qin, S.J., Bode, C.A., Purdy, M.A.

SPIE-The International Society for Optical Engineering
10 国際会議録 Mechanism of Chemical Mechanical Polishing Process for Oxide-Filled Shallow Trench Isolation Applications

Prasad, J., Misra, A., Sees, J., Morrison, B., Hall, L.

Electrochemical Society
5 国際会議録 A New Dummy-free Shallow Trench Isolation Concept for Mixed-Signal Applications

Badenes, G., Rooyackers, R., Augendre, E., Vandamme, E., Perello, C., Heylen, N., Grillaert, J., Deferm, L.

Electrochemical Society
11 国際会議録 Defect detection strategies for chemical-mechanical polishing process in shallow-trench isolation applications

Li,J.J., Liu,A.H., Hiemke,S.S.

SPIE - The International Society for Optical Engineering
6 国際会議録 Simplified CMP Planarization Process Module for Shallow Trench Isolation Applications

Kapkin, K., Alogaard, M., Curds, T., deRuiren, J.

Electrochemical Society
12 国際会議録 Application of backside fiber optic system for in-situ CMP endpoint detection on shallow-trench isolation wafers

Bakin,D.V., Glen,D.E., Sun,M.H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12