Blank Cover Image

Detection method for a T-topped profile in resist patterns by CD-SEM

著者名:
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
874
終了ページ:
880
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.2
資料種別:
国際会議録

類似資料:

1 国際会議録 Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance

Yamaguchi, A., Tsuchiya, R., Fukuda, H., Komuro, O., Kawada, H., Iizumi, T.

SPIE-The International Society for Optical Engineering
7 国際会議録 Application of top-down CD-SEM metrology in measuring and correlating profile with CD data in resist films with various thickness and sidewall profiles

Dixit,S.S., Azordegan,A.R., Liu,Y.

SPIE - The International Society for Optical Engineering
2 国際会議録 Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM

Kawada, H., Iizumi, T., Otaka, T.

SPIE-The International Society for Optical Engineering
8 国際会議録 Fine pixel CD-SEM for measurements of two-dimensional patterns

Yamaguchi, S., Itoh, M., Ikeda, T., Miyano, Y., Mitsui, T., Amma, M., Horikawa, S.

SPIE - The International Society of Optical Engineering
3 国際会議録 New approach to the focus exposure matrix(FEM)sample measurement using CD-SEM

Morokuma,H., Yamaguchi,S., Maeda,T., Iizumi,T., Ueda,K.

SPIE - The International Society for Optical Engineering
9 国際会議録 Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images

Shishido, C., Takagi, Y., Tanaka, M., Komuro, O., Morokuma, H., Sasada, K.

SPIE-The International Society for Optical Engineering
4 国際会議録 Bias-free measurement of LER/LWR with low damage by CD-SEM [6152-89]

Yamaguchi, A., Steffen, R., Kawada, H., Iizumi, T.

SPIE - The International Society of Optical Engineering
10 国際会議録 Characterization of line-edge roughness in Cu/low-k interconnect pattern

A. Yamaguchi, D. Ryuzaki, J. Yamamoto, H. Kawada, T. Iizumi

SPIE - The International Society of Optical Engineering
5 国際会議録 Novel CD-SEM calibration reference consisting of 100-nm pitch grating and positional identification mark

Y. Nakayama, H. Kawada, S. Yoneda, T. Mizuno

SPIE - The International Society of Optical Engineering
11 国際会議録 Effect of various ArF resist shrinkage amplitudes on CD bias

Ke, C.-M., Gau, T.-S., Chen, P.-H., Yen, A., Lin, B.J., Otaka, T., Iizumi, T., Sasada, K., Ueda, K.

SPIE-The International Society for Optical Engineering
6 国際会議録 Metrology of LER: influence of line-edge roughness (LER) on transistor performance

Yamaguchi, A., Ichinose, K., Shimamoto, S., Fukuda, H., Tsuchiya, R., Ohnishi, K., Kawada, H., Iizumi, T.

SPIE - The International Society of Optical Engineering
12 国際会議録 Cross-sectional gate feature identification method using top-down SEM images (Invited Paper)

Tanaka, M., Shishido, C., Takagi, Y., Morokuma, H., Komuro, O., Mori, H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12