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Production control of shallow trench isolation (STI) at the 130-nm node using spectroscopic ellipsometry-based profile metrology

著者名:
Peters, R.M. ( KLA-Tencor Corp. (USA) )
Chiao, R.H. ( Texas Instruments, Inc. (USA) )
Eckert, T. ( Texas Instruments, Inc. (USA) )
Labra, R. ( Texas Instruments, Inc. (USA) )
Nappa, D. ( Texas Instruments, Inc. (USA) )
Tang, S. ( Texas Instruments, Inc. (USA) )
Washington, J. ( Texas Instruments, Inc. (USA) )
さらに 2 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
798
終了ページ:
806
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.2
資料種別:
国際会議録

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