Experimental methodology of contact edge roughness on sub-100-nm pattern
- 著者名:
Lee, T.Y. ( Samsung Electronics Co., Ltd. (South Korea) ) Ihm, D. ( Samsung Electronics Co., Ltd. (South Korea) ) Kang, H.C. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, J.B. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, B.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chin, S.-B. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, Y.H. ( Applied Materials (Israel) ) Yang, H.D. ( Applied Materials (South Korea) ) Yang, K.M. ( Applied Materials (South Korea) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5375
- 発行年:
- 2004
- 開始ページ:
- 623
- 終了ページ:
- 632
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- 言語:
- 英語
- 請求記号:
- P63600/5375.1
- 資料種別:
- 国際会議録
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