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90-nm lithography process characterization using ODP scatterometry technology

著者名:
Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yu, S.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Wang, Y.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chou, Y.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, J.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lee, B.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chu, H.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, H.-T. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ku, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Huang, J. ( Timbre Technologies, Inc. (USA) )
Hsu, J.J. ( Timbre Technologies, Inc. (USA) )
Liu, V. ( Timbre Technologies, Inc. (USA) )
Hetzer, D. ( Timbre Technologies, Inc. (USA) )
Yap, L. ( Timbre Technologies, Inc. (USA) )
Yang, W. ( Timbre Technologies, Inc. (USA) )
Araki, K. ( Tokyo Electron, Ltd. (Japan) )
さらに 14 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
597
終了ページ:
604
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.1
資料種別:
国際会議録

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