OPC accuracy and process window verification methodology for sub-100-nm node
- 著者名:
Yang, H. ( Hynix Semiconductor, Inc. (South Korea) ) Park, C. ( Hynix Semiconductor, Inc. (South Korea) ) Hong, J. ( Hynix Semiconductor, Inc. (South Korea) ) Jeong, G. ( Hynix Semiconductor, Inc. (South Korea) ) Cho, B. ( Hynix Semiconductor, Inc. (South Korea) ) Choi, J. ( Hynix Semiconductor, Inc. (South Korea) ) Kang, C. ( Hynix Semiconductor, Inc. (South Korea) ) Yang, K. ( Hynix Semiconductor, Inc. (South Korea) ) Kang, E. ( Hynix Semiconductor, Inc. (South Korea) ) Ji, S. ( Hynix Semiconductor, Inc. (South Korea) ) Yim, D. ( Hynix Semiconductor, Inc. (South Korea) ) Song, Y. ( Hynix Semiconductor, Inc. (South Korea) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5375
- 発行年:
- 2004
- 開始ページ:
- 437
- 終了ページ:
- 443
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- 言語:
- 英語
- 請求記号:
- P63600/5375.1
- 資料種別:
- 国際会議録
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8
国際会議録
Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |