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CD metrology for the 45-nm and 32-nm nodes

著者名:
Rice, B.J. ( Intel Corp. (USA) )
Cao, H.B. ( Intel Corp. (USA) )
Chaudhuri, O. ( Lawrence Berkeley National Lab. (USA) )
Grumski, M.G. ( Intel Corp. (USA) )
Harteneck, B.D. ( Lawrence Berkeley National Lab. (USA) )
Liddle, A. ( Lawrence Berkeley National Lab. (USA) )
Olynick, D. ( Lawrence Berkeley National Lab. (USA) )
Roberts, J.M. ( Intel Corp. (USA) )
さらに 3 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
183
終了ページ:
190
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.1
資料種別:
国際会議録

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