Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node

Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node

著者名:

Bunday, B.D. ( International SEMATECH (USA) )
Bishop, M. ( International SEMATECH (USA) )
Allgair, J.A. ( Motorola (USA) and International SEMATECH (USA) )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5375

発行年:

2004

開始ページ:

151

終了ページ:

172

総ページ数:

22

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452887 [0819452882]

言語:

英語

請求記号:

P63600/5375.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013723
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2004 : 18th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.23-2004.02.26

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1 国際会議録 Specifications and methodologies for benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node and beyond Bunday, B.D., Bishop, M. SPIE-The International Society for Optical Engineering	7 国際会議録 Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control Bunday, B.D., Bishop, M., Bennett, M.H., Swyers, J.R., Haberman-Golan, Z. SPIE-The International Society for Optical Engineering
2 国際会議録 Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node Bunday, B.D., Bishop, M. SPIE-The International Society for Optical Engineering	8 国際会議録 Litho-metrology challenges for the 45-nmtechnology node and beyond (Invited Paper) [6152-12] Allgair, J. A., Bunday, B. D., Bishop, M., Lipscomb, P., Orji, N. G. SPIE - The International Society of Optical Engineering
3 国際会議録 Determination of optimal parameters for CD-SEM measurement of line-edge roughness Bunday, B.D., Bishop, M., McCormack, D.W., Jr., Villarrubia, J.S., Vladar, A.E., Dixson, R., Vorburger, T.V., Orji, … SPIE - The International Society of Optical Engineering	9 国際会議録 The coming of age of tilt CD-SEM B. Bunday, J. Allgair, E. Solecky, C. Archie, N. G. Orji, J. Beach, O. Adan, R. Peltinov, M. Bar-zvi, J. Swyers SPIE - The International Society of Optical Engineering
4 国際会議録 Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control and several different CMOS features Bunday, B.D., Bishop, M., Swyers, J.R., Lensing, K.R. SPIE-The International Society for Optical Engineering	10 国際会議録 SEM metrology for advanced lithographies B. Bunday, J. Allgair, B. J. Rice, J. Byers, Y. Avitan, R. Peltinov, M. Bar-zvi, O. Adan, J. Swyers, R. Z. Shneck SPIE - The International Society of Optical Engineering
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