Blank Cover Image

Alignment in chromeless masks

著者名:
Mukherjee-Roy, M. ( Institute of Microelectronics (Singapore) )
Singh, N. ( Institute of Microelectronics (Singapore) )
Mehta, S.S. ( Institute of Microelectronics (Singapore) )
Suda, H. ( HOYA Corp. (Japan) )
Kubota, T. ( HOYA Corp. (Japan) )
Kimura, Y. ( HOYA Corp. (Japan) )
Kinoshita, H. ( HOYA Corp. (Japan) )
さらに 2 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5375
発行年:
2004
開始ページ:
96
終了ページ:
104
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
言語:
英語
請求記号:
P63600/5375.1
資料種別:
国際会議録

類似資料:

1 国際会議録 Key challenges in across-pitch 0.33-k1 trench patterning using hybrid mask

Singh, N., Mukherjee-Roy, M., Mehta, S.S., Suda, H., Kubota, T., Kimura, Y., Kinoshita, H.

SPIE - The International Society of Optical Engineering
7 国際会議録 Effect of dissolution inhibitors on the dissolution characteristics of chemically amplified positive-tone electron beam resist

H. Horibe, T. Kumada, S. Kubota, Y. Kimura

Society of Photo-optical Instrumentation Engineers
2 国際会議録 Evaluation of alignment target designs for Cu and low-K dual damascene processes

Mukherjee-Roy, M., Singh, N., Mehta, S.S., Chik, W.M., Sim, C.T., Cheong, F.

SPIE-The International Society for Optical Engineering
8 国際会議録 Fabrication of the 70-nm line patterns with ArF chromeless phase-shift masks

Iwasaki, H., Ishida, S., Hashimoto, T.

SPIE-The International Society for Optical Engineering
3 国際会議録 Impact of scattering bars in damascene trench patterning

Mehta, S.S., Singh, N., Mukherjee-Roy, M., Kumar, R.

SPIE-The International Society for Optical Engineering
9 国際会議録 Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S.

SPIE-The International Society for Optical Engineering
4 国際会議録 Effect of feature size, pitch, and resist sensitivity on side-lobe and ring formation for via hole patterning in attenuated phase-shift masks

Singh, N., Mukherjee-Roy, M.

SPIE-The International Society for Optical Engineering
10 国際会議録 Polyacene (PAS) Capacitors.

Yata, S., Okamoto, E., Satake, H., Kubota, H., Fujii, M., Taguchi, T., Kinoshita, H.

Electrochemical Society
5 国際会議録 Patterning sub-50-nm Fin-FET using KrF lithography tool

Singh, N., Jagar, S., Mehta, S.S., Roy, M.M., Kumar, R., Balasubramanian, N.

SPIE - The International Society of Optical Engineering
11 国際会議録 Feasibility studies of ArF chromeless mask (CLM) for sub-80-nm era

Eom, T.-S., Lim, C.-M., Sung, M.G., Moon, S.-C., Shin, K.S.

SPIE - The International Society of Optical Engineering
6 国際会議録 Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Fritze,M., Burns,J.M., Wyatt,P.W., Astolfi,D.K., Forte,T., Yost,D., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., …

SPIE - The International Society for Optical Engineering
12 国際会議録 Phase defect repair for the chromeless phase lithography (CPL) mask

Fan, S., Hsu, M., Tseng, A., Chen, J.F., Van Den Broeke, D.J., Lei, H., Hsu, S., Shi, X.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12