Silanized polymeric working stamps for hot embossing lithography
- 著者名:
Wissen, M. ( Univ. of Wuppertal (Germany) ) Bogdanski, N. ( Univ. of Wuppertal (Germany) ) Jerzy, R. ( Univ. of Wuppertal (Germany) ) Berrada, Z.E. ( Univ. of Wuppertal (Germany) ) Fink, M. ( micro resist technology GmbH (Germany) ) Reuther, F. ( micro resist technology GmbH (Germany) ) Glinsner, T. ( EV Group (Austria) ) Scheer, H.-C. ( Univ. of Wuppertal (Germany) ) - 掲載資料名:
- Emerging Lithographic Technologies VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5374
- 発行年:
- 2004
- 開始ページ:
- 998
- 終了ページ:
- 1005
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452870 [0819452874]
- 言語:
- 英語
- 請求記号:
- P63600/5374.2
- 資料種別:
- 国際会議録
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6
国際会議録
Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist
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