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Membrane mask aeroelastic and thermoelastic control

著者名:
Huston, D.R. ( Univ. of Vermont (USA) )
Plumpton, J.O. ( Univ. of Vermont (USA) )
Esser, B. ( Univ. of Vermont (USA) )
Hoelzl, S. ( Univ. of Vermont (USA) and Technical Univ. of Munich (Germany) )
Wang, X. ( Univ. of Vermont (USA) )
Sullivan, G.A. ( JMAR/SAL Nanotechnologies, Inc. (USA) )
さらに 1 件
掲載資料名:
Emerging Lithographic Technologies VIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5374
発行年:
2004
開始ページ:
780
終了ページ:
790
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
言語:
英語
請求記号:
P63600/5374.2
資料種別:
国際会議録

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