The erosion of materials exposed to a laser-pulsed-plasma (LPP) extreme ultraviolet (EUV) illumination source

The erosion of materials exposed to a laser-pulsed-plasma (LPP) extreme ultraviolet (EUV) illumination source

著者名:

Anderson, R.J. ( Sandia National Labs. (USA) )
Buchenauer, D.A. ( Sandia National Labs. (USA) )
Klebanoff, L.E. ( Sandia National Labs. (USA) )
Wood, O.R., II ( International SEMATECH (USA) )
Edwards, N.V. ( International SEMATECH (USA) )

掲載資料名:

Emerging Lithographic Technologies VIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5374

発行年:

2004

開始ページ:

710

終了ページ:

719

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

言語:

英語

請求記号:

P63600/5374.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013722
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2004 : 8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.26

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