Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions

Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions

著者名:

Pain, L. ( CEA-LETI (France) )

Jurdit, M. ( CEA-LETI (France) )

LaPlanche, Y.T. ( STMicroelectronics (France) )

Todeschini, J. ( Philips Semiconductors (France) )

Manakli, S. ( STMicroelectronics (France) )

Bervin, G. ( Motorola, Inc. (France) )

Palla, R. ( STMicroelectronics (France) )

Beverina, A. ( STMicroelectronics (France) )

Faure, R. ( STMicroelectronics (France) )

Bossy, X. ( STMicroelectronics (France) )

Leininger, H. ( STMicroelectronics (France) )

Tourniol, S. ( STMicroelectronics (France) )

Broekaart, M. ( Philips Semiconductors (France) )

Judong, F. ( STMicroelectronics (France) )

Brosselin, K. ( STMicroelectronics (France) )

Gouraud, P. ( STMicroelectronics (France) )

De Jonghe, V. ( Philips Semiconductors (France) )

Henry, D. ( STMicroelectronics (France) )

Woo, M. ( Motorola, Inc. (France) )

Stolk, P. ( Philips Semiconductors (France) )

Tavel, B. ( Philips Semiconductors (France) )

Arnaud, F. ( STMicroelectronics (France) )

さらに 17 件

掲載資料名:

Emerging Lithographic Technologies VIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5374

発行年:

2004

開始ページ:

590

終了ページ:

600

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

言語:

英語

請求記号:

P63600/5374.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013722
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2004 : 8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.26

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