Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors

Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors

著者名:

La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) )

Pawloski, A.R. ( Advanced Micro Devices, Inc. (USA) )

Deng, Y. ( Advanced Micro Devices, Inc. (USA) and Univ. of California/Berkeley (USA) )

Chovino, C. ( DuPont Photomasks, Inc. (USA) )

Dieu, L. ( DuPont Photomasks, Inc. (USA) )

Wood, O.R., II ( Advanced Micro Devices, Inc. (USA) )

Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )

さらに 2 件

掲載資料名:

Emerging Lithographic Technologies VIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5374

発行年:

2004

開始ページ:

300

終了ページ:

310

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452870 [0819452874]

言語:

英語

請求記号:

P63600/5374.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013721
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2004 : 8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.26

類似資料:

1 国際会議録 EUV mask making: an approach based on the direct patterning of the EUV reflector Chovino, C., Dieu, L., Johnstone, E., Reyes, J., La Fontaine, B.M., Levinson, H.J., Pawloski, A.R. SPIE - The International Society of Optical Engineering	7 国際会議録 Characterization of line-edge roughness in photoresist using an image fading technique Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J. SPIE - The International Society of Optical Engineering
2 国際会議録 Influence of antireflection coatings in ArF lithography La Fontaine, B.M., Pawloski, A.R., Acheta, A., Deng, Y., Levinson, H.J., Spence, C., Chovino, C., Dieu, L., Johnstone, … SPIE - The International Society of Optical Engineering	8 国際会議録 The use of EUV lithography to produce demonstration devices A. La Fontaine, Y. Deng, R. Kim, H. J. Levinson, S. McGowan Society of Photo-optical Instrumentation Engineers
3 国際会議録 Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10] La Fontaine, B., Pawloski, A. R., Wood, O., Deng, Y., Levinson, H. J., Naulleau, P., Denham, P. E., Gullikson, E., Hoef, … SPIE - The International Society of Optical Engineering	9 国際会議録 Performance of repaired defects and attPSM in EUV multilayer masks Deng, Y., La Fontaine, B., Neureuther, A.R. SPIE-The International Society for Optical Engineering
4 国際会議録 Comparative study of mask architectures for EUV lithography Pawloski, A. R., La Fontaine, B., Levinson, H. J., Hirscher, S., Schwarzl, S., Lowack, K., Kamm, F. -M., Bender, M., … SPIE - The International Society of Optical Engineering	10 国際会議録 Flare and its impact on low-k1 KrF and ArF lithography La Fontaine, B., Dusa, M.V., Acheta, A., Chen, C., Bourov, A., Levinson, H.J., Litt, L.C., Mulder, M., Seltman, R., van … SPIE-The International Society for Optical Engineering
5 国際会議録 Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging Deng, Y., Fontaine, B.M.L., Levinson, H.J., Neureuther, A.R. SPIE-The International Society for Optical Engineering	11 国際会議録 Mask technology for EUV lithography Bujak,M., Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Moore,C.E., Prisbrey,S., Sweeney,D.W., Tong,W.M., Vernon,S.P., … SPIE - The International Society for Optical Engineering
6 国際会議録 Simulation of fine structures and defects in EUV etched multilayer masks Deng, Y., La Fontaine, B., Pawloski, A.R., Neureuther, A.R. SPIE - The International Society of Optical Engineering	12 国際会議録 Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer T. Wallow, A. Acheta, Y. Ma, A. Pawloski, S. Bell, B. Ward, C. Tabery, B. L. Fontaine, R. Kim, S. McGowan, H. J. … SPIE - The International Society of Optical Engineering

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