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Process latitude measurements and their implications for CD control in EUV lithography

著者名:
Cobb, J. ( Motorola, Inc. (USA) )
Peters, R. ( Motorola, Inc. (USA) )
Postnikov, S. ( Motorola, Inc. (USA) )
Hector, S.D. ( Motorola, Inc. (USA) )
Lu, B. ( Motorola, Inc. (USA) )
Weisbrod, E. ( Motorola, Inc. (USA) )
Wasson, J.R. ( Motorola, Inc. (USA) )
Mangat, P. ( Motorola, Inc. (USA) )
O'Connell, D. ( Sandia National Labs. (USA) )
さらに 4 件
掲載資料名:
Emerging Lithographic Technologies VIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5374
発行年:
2004
開始ページ:
43
終了ページ:
52
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452870 [0819452874]
言語:
英語
請求記号:
P63600/5374.1
資料種別:
国際会議録

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