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High-performance thick copper inductors in an RF technology

著者名:
Vaed, K. ( IBM Semiconductor Research and Development Ctr. (USA) )
Graham, W. ( IBM Thomas J. Watson Research Ctr. (USA) )
Steen, M. ( IBM Thomas J. Watson Research Ctr. (USA) )
Park, J.-E. ( IBM Semiconductor Research and Development Ctr. (USA) )
Groves, R. ( IBM Semiconductor Research and Development Ctr. (USA) )
Volant, R. ( IBM Semiconductor Research and Development Ctr. (USA) )
Nunes, R. ( IBM Thomas J. Watson Research Ctr. (USA) )
Vichiconti, J. ( IBM Thomas J. Watson Research Ctr. (USA) )
Stein, K. ( IBM Semiconductor Research and Development Ctr. (USA) )
Ahlgren, D. ( IBM Semiconductor Research and Development Ctr. (USA) )
さらに 5 件
掲載資料名:
Micromachining and Microfabrication Process Technology IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5342
発行年:
2004
開始ページ:
74
終了ページ:
85
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452504 [0819452505]
言語:
英語
請求記号:
P63600/5342
資料種別:
国際会議録

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