Formation process of Si nanoparticles deposited by pulse laser ablation

Formation process of Si nanoparticles deposited by pulse laser ablation

著者名:

Wang, Y. ( Hebei Univ. (China) )

Zhang, R. ( Hebei Univ. (China) )

Fu, G. ( Hebei Univ. (China) )

Peng, Y. ( Hebei Univ. (China) )

Han, L. ( Hebei Univ. (China) )

Chu, L. ( Hebei Univ. (China) )

さらに 1 件

掲載資料名:

Materials, Active Devices, and Optical Amplifiers

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5280

発行年:

2004

開始ページ:

78

終了ページ:

84

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451750 [0819451754]

言語:

英語

請求記号:

P63600/5280.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013622
シリーズID:	PA00000029
会議名:	APOC : Asia Communications and Photonics
回次:	2003
会議開催地:	Wuhan, China
会議開催年:	2003.11.04-2003.11.06

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