Interferometric-probe monitors for self-diagnostics of phase-shifting mask performance

Interferometric-probe monitors for self-diagnostics of phase-shifting mask performance

著者名:

McIntyre, G.R. ( Univ. of California/Berkeley (USA) )
Neureuther, A. ( Univ. of California/Berkeley (USA) )

掲載資料名:

23rd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5256

発行年:

2003

開始ページ:

1324

終了ページ:

1330

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

言語:

英語

請求記号:

P63600/5256.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013601
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2003 : 23rd
会議開催地:	Monterey, California, USA
会議開催年:	2003.09.09-2003.09.12

類似資料:

1 国際会議録 Initial experimental verification: characterizing tool illumination and PSM performance with phase-shifting masks McIntyre, G.R., Neureuther, A.R. SPIE - The International Society of Optical Engineering	7 国際会議録 The effects of the photomask on multiphase shift test monitors [6349-135] Mcintyre, G., Neureuther, A. SPIE - The International Society of Optical Engineering
2 国際会議録 Characterizing illumination angular uniformity with phase-shifting masks McIntyre, G., Neureuther, A.R. SPIE-The International Society for Optical Engineering	8 国際会議録 Interferometric-probe aberration monitor performance in the production environment Robins, G.C., Neureuther, A.R., Dusa, M., Kye, J. SPIE - The International Society of Optical Engineering
3 国際会議録 Phase shifting mask as a precision instrument for characterizing image-forming optical systems [5878-08] Mcintyre, G., Robbins, G., Neureuther, A. SPIE - The International Society of Optical Engineering	9 国際会議録 Characterizing the demons in high-NA phase-shifting masks Robins, G. C., Neureuther, A. R. SPIE - The International Society of Optical Engineering
4 国際会議録 Experimental verification of PSM polarimetry: monitoring polarization at 193-nrn high-NA with phase-shift masks [6154-13] Mcintyre, G., Neureuther, A., Slonaker, S., Vellanki, V., Reynolds, P. SPIE - The International Society of Optical Engineering	10 国際会議録 Images in photoresist for self-interferometric electrical image monitors J. Rubinstein, A. R. Neureuther Society of Photo-optical Instrumentation Engineers
5 国際会議録 EUV phase-shifting masks and aberration monitors Deng, Y., Neureuther, A.R. SPIE-The International Society for Optical Engineering	11 国際会議録 Self-interferometric electrical image monitors [6152-41] Holwil, J., Neureuther, A. R. SPIE - The International Society of Optical Engineering
6 国際会議録 Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook G. McIntyre, R. Tu Society of Photo-optical Instrumentation Engineers	12 国際会議録 DRC and mask friendly pattern and probe aberration monitors J. Holwill, A. R. Neureuther SPIE - The International Society of Optical Engineering

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