A novel electron-beam-based photomask repair tool
- 著者名:
Edinger, K. ( NaWoTec GmbH (Germany) ) Becht, H. ( NaWoTec GmbH (Germany) ) Becker, R. ( NaWoTec GmbH (Germany) ) Bert, V. ( NaWoTec GmbH (Germany) ) Boegli, V.A. ( NaWoTec GmbH (Germany) ) Budach, M. ( NaWoTec GmbH (Germany) ) Gyhde, S. ( NaWoTec GmbH (Germany) ) Guyot, J. ( NaWoTec GmbH (Germany) ) Hofmann, T. ( NaWoTec GmbH (Germany) ) Hoinkis, O. ( NaWoTec GmbH (Germany) ) Kaya, A. ( NaWoTec GmbH (Germany) ) Koops, H.W. ( NaWoTec GmbH (Germany) ) Spies, P. ( NaWoTec GmbH (Germany) ) Weyrauch, B. ( NaWoTec GmbH (Germany) ) Bihr, J. ( LEO Elektronenmikroskopie GmbH (Germany) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 1222
- 終了ページ:
- 1231
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
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