DUV inspection capability for 90-nm node mask in ArF lithography
- 著者名:
Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kim, B.G. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Tanaka, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Tateno, M. ( NEC Corp. (Japan) ) Takayama, N. ( NEC Corp. (Japan) ) Murakami, S. ( NEC Corp. (Japan) ) Hatta, K. ( NEC Corp. (Japan) ) Akima, S. ( Toppan Printing Co., Ltd. (Japan) ) Matsuo, F. ( Toppan Printing Co., Ltd. (Japan) ) Otaki, M. ( Toppan Printing Co., Ltd. (Japan) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 1181
- 終了ページ:
- 1190
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
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8
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