Second-level imaging of advanced alternating phase-shift masks using e-beam lithography

Second-level imaging of advanced alternating phase-shift masks using e-beam lithography

著者名:

Leibold, B. ( Institut fur Mikroelektronik Stuttgart (Germany) )

Butschke, J. ( Institut fur Mikroelektronik Stuttgart (Germany) )

Bettin, L. ( Leica Microsystems Lithography (Germany) )

Beyer, D. ( Leica Microsystems Lithography (Germany) )

Irmscher, M. ( Institut fyr Mikroelektronik Stuttgart (Germany) )

Koepernik, C. ( Institut fyr Mikroelektronik Stuttgart (Germany) )

Plontke, R. ( Leica Microsystems Lithography (Germany) )

Vix, A. ( Infineon Technologies AG (Germany) )

Voehringer, P. ( Institut fyr Mikroelektronik Stuttgart (Germany) )

さらに 4 件

掲載資料名:

23rd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5256

発行年:

2003

開始ページ:

1034

終了ページ:

1044

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

言語:

英語

請求記号:

P63600/5256.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013601
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2003 : 23rd
会議開催地:	Monterey, California, USA
会議開催年:	2003.09.09-2003.09.12

類似資料:

1 国際会議録 Alternating aperture phase shift mask process using e-beam lithography for the second level Koepernik, C., Butschke, J., Beyer, D., Irmscher, M., Leibold, B., Rausa, E., Plontke, R., Plumhoff, J., Voehringer, P. SPIE - The International Society of Optical Engineering	7 国際会議録 Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024 Irmscher, M., Beyer, D., Butschke, J., Hudek, P., Koepernik, C., Plumhoff, J., Rausa, E., Sato, M., Voehringer, P. SPIE - The International Society of Optical Engineering
2 国際会議録 Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z Plontke, R., Bettin, L., Beyer, D., Butschke, J., Irmscher, M., Koepernik, C., Leibold, B., Vix, A. B. E., Voehringer, … SPIE - The International Society of Optical Engineering	8 国際会議録 Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update Schwersenz, A., Butschke, J., Feicke, A., Irmscher, M., Voehringer, P. SPIE - The International Society of Optical Engineering
3 国際会議録 Comparative evaluation of e-beam sensitive chemically amplifild resists for mask making Irmscher, M., Beyer, D., Butschke, J., Constantine, C., Hoffmann, T., Koepernik, C., Krauss, C., Leibold, B., Letzkus, … SPIE-The International Society for Optical Engineering	9 国際会議録 Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123] Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering
4 国際会議録 Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making Irmscher, M., Berger, L., Beyer, D., Butschke, J., Dress, P., Hoffmann, T., Hudek, P., Koepernik, C., Tschinkl, M., … SPIE-The International Society for Optical Engineering	10 国際会議録 Mask patterning for the 22nm node using a proton multi-beam projection pattern generator (Second Place Best Poster Award) J. Butschke, M. Irmscher, H. Sailer, L. Nedelmann, M. Pritschow Society of Photo-optical Instrumentation Engineers
5 国際会議録 Mask pafferning using chemically amplified resists and the novel STEAG HamaTech blank coater ASR5000 Koepernik, C., Beyer, D., Dress, P., Hoffmann, T., Hudek, P., Irmscher, M., Krauss, C., Leibold, B., Mueller, D., … SPIE-The International Society for Optical Engineering	11 国際会議録 Defect dispositiong using mask printability analysis on alternating phase-shifting masks Chang, C.-H., Hsieh, C.-H., Tzu, S.-D., Dai, C.-M., Lin, B. J., Pang, L., Qian, Q.-D., Chen, J.-H., Huang, J. H. SPIE-The International Society for Optical Engineering
6 国際会議録 90-nm mask making processes using the positive tone chemically amplified resist FEP171 Butschke, J., Beyer, D., Constantine, C., Dress, P., Hudek, P., Irmscher, M., Koepernik, C., Krauss, C., Plumhoff, J., … SPIE - The International Society of Optical Engineering	12 国際会議録 Second level printing of advanced phase shift masks using DUV laser lithography [5853-93] Howard, C., Park, K.-T., Scherer, M., Stankovic, S., Cantrell, R., Herrmann, M. SPIE - The International Society of Optical Engineering

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