Influence of antireflection coatings in ArF lithography

Influence of antireflection coatings in ArF lithography

著者名:

La Fontaine, B.M. ( Advanced Micro Devices, Inc. (USA) )

Pawloski, A.R. ( Advanced Micro Devices, Inc. (USA) )

Acheta, A. ( Advanced Micro Devices, Inc. (USA) )

Deng, Y. ( Advanced Micro Devices, Inc. (USA) and Univ. of California/Berkeley (USA) )

Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )

Spence, C. ( Advanced Micro Devices, Inc. (USA) )

Chovino, C. ( DuPont Photomasks, Inc. (USA) )

Dieu, L. ( DuPont Photomasks, Inc. (USA) )

Johnstone, E. ( DuPont Photomasks, Inc. (USA) )

Kalk, F. ( DuPont Photomasks, Inc. (USA) )

さらに 5 件

掲載資料名:

23rd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5256

発行年:

2003

開始ページ:

995

終了ページ:

1005

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

言語:

英語

請求記号:

P63600/5256.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013601
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2003 : 23rd
会議開催地:	Monterey, California, USA
会議開催年:	2003.09.09-2003.09.12

類似資料:

1 国際会議録 EUV mask making: an approach based on the direct patterning of the EUV reflector Chovino, C., Dieu, L., Johnstone, E., Reyes, J., La Fontaine, B.M., Levinson, H.J., Pawloski, A.R. SPIE - The International Society of Optical Engineering	7 国際会議録 Study of the influence of substrate topography on the focusing performance of advanced lithography scanners Fontaine, B.M.L., Hauschild, J., Dusa, M.V., Acheta, A., Apelgren, E.M., Boonman, M., Krist, J., Khathuria, A., … SPIE-The International Society for Optical Engineering
2 国際会議録 Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors La Fontaine, B., Pawloski, A.R., Deng, Y., Chovino, C., Dieu, L., Wood, O.R., II, Levinson, H.J. SPIE - The International Society of Optical Engineering	8 国際会議録 Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer T. Wallow, A. Acheta, Y. Ma, A. Pawloski, S. Bell, B. Ward, C. Tabery, B. L. Fontaine, R. Kim, S. McGowan, H. J. … SPIE - The International Society of Optical Engineering
3 国際会議録 Characterization of line-edge roughness in photoresist using an image fading technique Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J. SPIE - The International Society of Optical Engineering	9 国際会議録 The transfer of photoresist LER through etch [6153-45] Pawloski, A. R., Acheta, A., Bell, S., La Fontaine, B., Wallow, T., Levinson, H. J. SPIE - The International Society of Optical Engineering
4 国際会議録 Flare and its impact on low-k1 KrF and ArF lithography La Fontaine, B., Dusa, M.V., Acheta, A., Chen, C., Bourov, A., Levinson, H.J., Litt, L.C., Mulder, M., Seltman, R., van … SPIE-The International Society for Optical Engineering	10 国際会議録 Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography C. S. Saravanan, S. Nirmalgandhi, O. Kritsun, A. Acheta, R. Sandberg, B. L. Fontaine, H. J. Levinson, K. Lensing, M. … SPIE - The International Society of Optical Engineering
5 国際会議録 Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10] La Fontaine, B., Pawloski, A. R., Wood, O., Deng, Y., Levinson, H. J., Naulleau, P., Denham, P. E., Gullikson, E., Hoef, … SPIE - The International Society of Optical Engineering	11 国際会議録 Analysis of focus errors in lithography using phase-shift monitors La Fontaine, B., Dusa, M.V., Krist, J., Acheta, A., Kye, J., Levinson, H.J., Luijten, C., Sager, C.B., Thomas, J., van … SPIE-The International Society for Optical Engineering
6 国際会議録 Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging Deng, Y., Fontaine, B.M.L., Levinson, H.J., Neureuther, A.R. SPIE-The International Society for Optical Engineering	12 国際会議録 Comparative study of mask architectures for EUV lithography Pawloski, A. R., La Fontaine, B., Levinson, H. J., Hirscher, S., Schwarzl, S., Lowack, K., Kamm, F. -M., Bender, M., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12