Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners
- 著者名:
Ebihara, T. ( Canon USA, Inc. (USA) ) Levenson, M.D. ( M.D. Levenson Consulting (USA) ) Liu, W. ( Applied Materials Inc. (USA) ) He, J. ( Applied Materials Inc. (USA) ) Yeh, W. ( Applied Materials Inc. (USA) ) Ahn, S. ( Applied Materials Inc. (USA) ) Oga, T. ( Canon USA, Inc. (USA) ) Shen, M. ( Applied Materials Inc. (USA) ) M'saad, H. ( Applied Materials Inc. (USA) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 985
- 終了ページ:
- 994
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
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