Blank Cover Image

Flows for model-based layout correction of mask proximity effects

著者名:
掲載資料名:
23rd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5256
発行年:
2003
開始ページ:
956
終了ページ:
964
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819451439 [0819451436]
言語:
英語
請求記号:
P63600/5256.2
資料種別:
国際会議録

類似資料:

1 国際会議録 Phase aware proximity correction for advanced masks

Toublan,O., Sahouria,E.Y., Cobb,N.B., Do,T., Donnelly,T., Granik,Y., Schellenberg,F.M., Schiavone,P.

SPIE - The International Society for Optical Engineering
7 国際会議録 Integration of alternating phase-shift mask technology into optical proximity correction

Thiele,J., Friedrich,C., Dolainsky,C., Karakatsanis,P., Maurer,W.

SPIE - The International Society for Optical Engineering
2 国際会議録 Mathematical and CAD framework for proximity correction

Cobb,N.B., Zakhor,A., Miloslavsky,E.

SPIE-The International Society for Optical Engineering
8 国際会議録 Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Capodieci,L., Torres,J.A., Socha,R.J., Hollerbach,U., Chen,J.F., Os,C.van, Granik,Yu., Toublan,O., Cobb,N.B.

SPIE-The International Society for Optical Engineering
3 国際会議録 Application of a simple resist model to fast optical proximity correction

Dolainsky,C., Maurer,W.

SPIE-The International Society for Optical Engineering
9 国際会議録 Validating optical proximity correction with models, masks and wafers

S. Marokkey, E. W. Conrad, E. E. Gallagher, H. Ikeda, J. A. Bruce

Society of Photo-optical Instrumentation Engineers
4 国際会議録 Evaluation of resist models for fast optical proximity correction

Dolainsky,C., Maurer,W., Waas,T.

SPIE-The International Society for Optical Engineering
10 国際会議録 Extreme mask corrections: technology and benefits

Y. Granik, N. Cobb, D. Medvedev

Society of Photo-optical Instrumentation Engineers
5 国際会議録 Experimental results on optical proximity correction with variable-threshold resist model

Cobb,N.B., Zakhor,A., Reihani,M., Jahansooz,F., Raghavan,V.N.

SPIE-The International Society for Optical Engineering
11 国際会議録 Improvements to mask inspectability by use of pattern proximity correction

Rosenbusch,A., Bailey,V., Eran,Y., Falah,R., Holmes,N.J., Hourd,A.C., McArthur,A., Staud,W.

SPIE - The International Society for Optical Engineering
6 国際会議録 Proximity effects of alternating phase-shift masks

Maurer,W., Friedrich,C., Mader,L., Thiele,J.

SPIE - The International Society for Optical Engineering
12 国際会議録 Model-based OPC using the MEEF matrix

Cobb, N,B,, Granik, Y.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12