Effect of mask pattern fidelity on 193-nm lithography performance
- 著者名:
Cheng, C.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Su, T.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tsai, F.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tsai, T.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tu, C.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Yoo, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 937
- 終了ページ:
- 944
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
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