157-nm alternating phase-shifting mask design and high-NA images
- 著者名:
- Chen, Y.-T. ( Matrix Semiconductor (USA) )
- Meute, J. ( International SEMATECH (USA) )
- Dean, K. ( International SEMATECH (USA) )
- Brooker, P.D. ( SIGMA-C (USA) )
- 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 905
- 終了ページ:
- 912
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
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2
国際会議録
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
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Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
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