Study of alternating phase-shift mask structure for 65-nm node devices
- 著者名:
Konishi, T. ( Toppan Printing Co., Ltd. (Japan) ) Komizo, T. ( Toppan Printing Co., Ltd. (Japan) ) Takahashi, H. ( Toppan Printing Co., Ltd. (Japan) ) Morita, M. ( Toppan Printing Co., Ltd. (Japan) ) Ohshima, T. ( Toppan Printing Co., Ltd. (Japan) ) Chiba, K. ( Toppan Printing Co., Ltd. (Japan) ) Kojima, Y. ( Toppan Printing Co., Ltd. (Japan) ) Sasaki, J. ( Toppan Printing Co., Ltd. (Japan) ) Tanaka, K. ( Toppan Printing Co., Ltd. (Japan) ) Otaki, M. ( Toppan Printing Co., Ltd. (Japan) ) Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 880
- 終了ページ:
- 888
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
Performance study of chromeless phase lithography mask for the 65nm node and beyond [6154-81]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |