Mask-making study for the 65-nm node
- 著者名:
Chen, C.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lee, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lu, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chen, W.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 673
- 終了ページ:
- 683
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.1
- 資料種別:
- 国際会議録
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12
国際会議録
Study of mask structure for 45-nm node based on manufacturability and lithographic performance
SPIE - The International Society of Optical Engineering |