METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination
- 著者名:
- Zhu, Z. ( Carnegie Mellon Univ. (USA) )
- Lucas, K.D. ( Motorola, Inc. (USA) )
- Cobb, J.L. ( Motorola, Inc. (USA) )
- Hector, S.D. ( Motorola, Inc. (USA) )
- Strojwas, A.J. ( Carnegie Mellon Univ. (USA) )
- 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 585
- 終了ページ:
- 594
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.1
- 資料種別:
- 国際会議録
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