EUV mask making: an approach based on the direct patterning of the EUV reflector

EUV mask making: an approach based on the direct patterning of the EUV reflector

著者名:

Chovino, C. ( DuPont Photomasks, Inc. (USA) )

Dieu, L. ( DuPont Photomasks, Inc. (USA) )

Johnstone, E. ( DuPont Photomasks, Inc. (USA) )

Reyes, J. ( DuPont Photomasks, Inc. (USA) )

La Fontaine, B.M. ( Advanced Micro Devices, Inc. (USA) )

Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )

Pawloski, A.R. ( Advanced Micro Devices, Inc. (USA) )

さらに 2 件

掲載資料名:

23rd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5256

発行年:

2003

開始ページ:

566

終了ページ:

572

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

言語:

英語

請求記号:

P63600/5256.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013600
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2003 : 23rd
会議開催地:	Monterey, California, USA
会議開催年:	2003.09.09-2003.09.12

類似資料:

1 国際会議録 Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors La Fontaine, B., Pawloski, A.R., Deng, Y., Chovino, C., Dieu, L., Wood, O.R., II, Levinson, H.J. SPIE - The International Society of Optical Engineering	7 国際会議録 Comparative study of mask architectures for EUV lithography Pawloski, A. R., La Fontaine, B., Levinson, H. J., Hirscher, S., Schwarzl, S., Lowack, K., Kamm, F. -M., Bender, M., … SPIE - The International Society of Optical Engineering
2 国際会議録 Influence of antireflection coatings in ArF lithography La Fontaine, B.M., Pawloski, A.R., Acheta, A., Deng, Y., Levinson, H.J., Spence, C., Chovino, C., Dieu, L., Johnstone, … SPIE - The International Society of Optical Engineering	8 国際会議録 Simulation of fine structures and defects in EUV etched multilayer masks Deng, Y., La Fontaine, B., Pawloski, A.R., Neureuther, A.R. SPIE - The International Society of Optical Engineering
3 国際会議録 Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging Deng, Y., Fontaine, B.M.L., Levinson, H.J., Neureuther, A.R. SPIE-The International Society for Optical Engineering	9 国際会議録 EUV mask patterning approaches Yan,P., Zhang,G., Kofron,P., Chow,J., Stivers,A.R., Tejnil,E., Cardinale,G.F., Kearney,P.A. SPIE - The International Society for Optical Engineering
4 国際会議録 Characterization of line-edge roughness in photoresist using an image fading technique Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J. SPIE - The International Society of Optical Engineering	10 国際会議録 Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer T. Wallow, A. Acheta, Y. Ma, A. Pawloski, S. Bell, B. Ward, C. Tabery, B. L. Fontaine, R. Kim, S. McGowan, H. J. … SPIE - The International Society of Optical Engineering
5 国際会議録 Demonstration of phase-shift masks for extreme-ultraviolet lithography [6151-10] La Fontaine, B., Pawloski, A. R., Wood, O., Deng, Y., Levinson, H. J., Naulleau, P., Denham, P. E., Gullikson, E., Hoef, … SPIE - The International Society of Optical Engineering	11 国際会議録 The transfer of photoresist LER through etch [6153-45] Pawloski, A. R., Acheta, A., Bell, S., La Fontaine, B., Wallow, T., Levinson, H. J. SPIE - The International Society of Optical Engineering
6 国際会議録 193-nm haze contamination: a close relationship between mask and its environment Johnstone, E., Dieu, L., Chovino, C., Reyes, J., Hong, D., Krishnan, P., Coburn, D., Capella, C. SPIE - The International Society of Optical Engineering	12 国際会議録 Performance of repaired defects and attPSM in EUV multilayer masks Deng, Y., La Fontaine, B., Neureuther, A.R. SPIE-The International Society for Optical Engineering

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