Material removal strategies and results for 193-nm lithography using FIB mask repair

Material removal strategies and results for 193-nm lithography using FIB mask repair

著者名:

Ferranti, D.C. ( FEI Co. (USA) )
Graupera, A. ( FEI Co. (United Kingdom) )
Marshman, J. ( FEI Co. (USA) )
Stewart, D.K. ( FEI Co. (USA) )
Szelag, S.M. ( FEI Co. (USA) )

掲載資料名:

23rd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5256

発行年:

2003

開始ページ:

546

終了ページ:

555

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

言語:

英語

請求記号:

P63600/5256.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013600
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2003 : 23rd
会議開催地:	Monterey, California, USA
会議開催年:	2003.09.09-2003.09.12

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