Enhanced dispositioning of reticle defects for advanced masks using virtual stepper with automated defect severity scoring
- 著者名:
Pang, L. ( Synopsys, Inc. (USA) ) Lu, A. ( Semiconductor Manufacturing International Corp. (China) ) Chen, J. ( Semiconductor Manufacturing International Corp. (China) ) Guo, E. ( Semiconductor Manufacturing International Corp. (China) ) Cai, L. ( Synopsys, Inc. (USA) ) Chen, J.-H. ( Synopsys, Inc. (USA) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 461
- 終了ページ:
- 473
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.1
- 資料種別:
- 国際会議録
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