Mask pattern fidelity quantification
- 著者名:
Wang, W.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chang, S.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chin, C.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lu, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chin, A.S.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Yu, S.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 266
- 終了ページ:
- 275
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Fidelity comparison of island patterns with different types of illuminations and phase shift masks
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |