Implementing AAPSM in 90-nm product with practical image imbalance correction
- 著者名:
Lin, B.S. ( United Microelectronics Corp. (Taiwan) ) Hsu, S.- ( United Microelectronics Corp. (Taiwan) ) Huang, I.H. ( United Microelectronics Corp. (Taiwan) ) Chen, K. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsu, T. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Liu, H.-Y. ( Synopsys, Inc. (USA) ) Kroyan, A. ( Synopsys, Inc. (USA) ) Hsu, F. ( Synopsys, Inc. (USA) ) Huang, J. ( Synopsys, Inc. (USA) ) - 掲載資料名:
- 23rd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5256
- 発行年:
- 2003
- 開始ページ:
- 103
- 終了ページ:
- 111
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- 言語:
- 英語
- 請求記号:
- P63600/5256.1
- 資料種別:
- 国際会議録
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3
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Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
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