Vortex via validation

Vortex via validation

著者名:

Levenson, M.D. ( M.D. Levenson Consulting (USA) )
Ebihara, T. ( Canon USA, Inc. (USA) )
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )

掲載資料名:

23rd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5256

発行年:

2003

開始ページ:

93

終了ページ:

102

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819451439 [0819451436]

言語:

英語

請求記号:

P63600/5256.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013600
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2003 : 23rd
会議開催地:	Monterey, California, USA
会議開催年:	2003.09.09-2003.09.12

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1 国際会議録 Vortex via process: analysis and mask fabrication for contact CDs <80 nm Levenson, M.D., Tan, S.M., Dai, G., Morikawa, Y., Hayashi, N., Ebihara, T. SPIE-The International Society for Optical Engineering	7 国際会議録 Wavefront engineering from 500-to 100-nm CD Levenson,M.D. SPIE-The International Society for Optical Engineering
2 国際会議録 Advances in vortex via fabrication Levenson, M.D., Ebihara, T.J., Reilly, M., Barclay, G., Vorha, V., Stafford, C., Mastovich, M.E., Morikawa, Y., Hayashi, … SPIE - The International Society of Optical Engineering	8 国際会議録 Wavefront engineering from 500-to 100-nm CD Levenson,M.D. SPIE-The International Society for Optical Engineering
3 国際会議録 The vortex mask: making 80-nm contacts with a twist! Levenson, M.D., Dai, G., Ebihara, T. SPIE-The International Society for Optical Engineering	9 国際会議録 Wavefront engineering from 500-to 100-nm CD Levenson,M.D. SPIE-The International Society for Optical Engineering
4 国際会議録 Exposing the DUV SCAAM: 75-nm imaging on the cheap Levenson, M.D., Ebihara, T. SPIE-The International Society for Optical Engineering	10 国際会議録 Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners Ebihara, T., Levenson, M.D., Liu, W., He, J., Yeh, W., Ahn, S., Oga, T., Shen, M., M'saad, H. SPIE - The International Society of Optical Engineering
5 国際会議録 SCAA mask exposures and Phase Phirst designs for 100 nm and below Levenson,M.D., Ebihara,T., Yamachika,M. SPIE-The International Society for Optical Engineering	11 国際会議録 Automated SEM metrology of wafers printed using a SCAA mask Desai, S., Edihara, T., Levenson, M.D., White, S. SPIE-The International Society for Optical Engineering
6 国際会議録 Wavefront engineering from 500-to 100-nm CD Levenson,M.D. SPIE-The International Society for Optical Engineering	12 国際会議録 Photomask repair performance of the SiON/Ta-Hf attenuating PSM Nishiguchi, M., Amano, T., Sasaki, S., Morikawa, Y., Hayashi, N. SPIE - The International Society of Optical Engineering

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