A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode

A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode

著者名:

Maldonado, J.R. ( Etec Systems, Inc. (USA) )

Coyle, S.T. ( Etec Systems, Inc. (USA) )

Shamoun, B. ( Etec Systems, Inc. (USA) )

Yu, M. ( Etec Systems, Inc. (USA) )

Thomas, T.N. ( TKD, Inc. (USA) )

Holmgren, D.E. ( Etec Systems, Inc. (USA) )

Chen, X. ( Etec Systems, Inc. (USA) )

DeVore, B. ( Etec Systems, Inc. (USA) )

Scheinfein, M.R. ( Simon Frasier Univ. (Canada) )

Gesley, M.A. ( Etec Systems, Inc. (USA) )

さらに 5 件

掲載資料名:

Nanofabrication Technologies

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5220

発行年:

2003

開始ページ:

46

終了ページ:

51

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819450937 [0819450936]

言語:

英語

請求記号:

P63600/5220

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013574
シリーズID:	PA00000029
会議名:	Optics & Photonics : Nanofabrication Technologies
回次:	2003
会議開催地:	San Diego, CA, USA
会議開催年:	2003.08.03-2003.08.04

類似資料:

1 国際会議録 Raster scan patterning solution for 100-and 70-nm OPC masks Abboud, F.E., Baik, K.-H., Chakarian, V., Cole, D. M., Dean, R.L., Gesley M.A., Gillman. H., Moore, W.C., Mueller, M., … SPIE-The International Society for Optical Engineering	7 国際会議録 Next-generation 193-nm laser for sub-100-nm lithography Duffey,T.P., Blumenstock,G.M., Fleurov,V.B., Pan,X.J., Newman,P.C., Glatzel,H., Watson,T.A., Erxmeyer,J., … SPIE-The International Society for Optical Engineering
2 国際会議録 100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology Abboud,F.E., Baik,K.-H., Chakarian,V., Cole,D.M., Daniel,J.P., Dean,R.L., Gesley,M.A., Lu,M., Naber,R.J., Newman,T.H., … SPIE-The International Society for Optical Engineering	8 国際会議録 REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology Baik, K.-H., Dean, R.L., Mueller, M., Lu, M., Lem, H.Y., Osborne, S., Abboud, F.E. SPIE-The International Society for Optical Engineering
3 国際会議録 Pattern generation requirements for mask making beyond 130 nm Abboud,F.E., Gesley,M.A., Maldonado,J.R. SPIE-The International Society for Optical Engineering	9 国際会議録 Step and flash imprint lithography for sub-100-nm patterning Colburn,M., Grot,A., Amistoso,M.N., Choi,B.J., Bailey,T.C., Ekerdt,J.G., Sreenivasan,S.V., Hollenhorst,J., Willson,C.G. SPIE - The International Society for Optical Engineering
4 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	10 国際会議録 CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering
5 国際会議録 *Soft X-rays for deep sub-100 nm lithography, with and without masks Smith, Henry I., Carter, D. J.D., Ferrera, J., Gil, D., Goodberlet, J., Hastings, J. T., Lim, M. H., Meinhold, M., … MRS-Materials Research Society	11 国際会議録 Large-area nanoimprint fabrication of sub-100-nm interdigitated metal arrays Montelius,L., Heidari,B., Graczyk,M., Ling,T., Maximov,I., Sarwe,E.-L. SPIE - The International Society for Optical Engineering
6 国際会議録 Evaluation of OPC mask printing with a raster scan pattern generator Newman, T.H., Chabala, J.M., Marleau, B.J., Raymond, F., III, Toublan, O., Gesley, M.A., Abboud, F.E. SPIE-The International Society for Optical Engineering	12 国際会議録 Mask fabrication towards sub-10 nm imprint lithography Jung, G. Y., Wu, W., Li, Z., Wang, S. Y., Tong, W. M., Williams, R. S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12