A comparison of uranium oxide and nickle as single-layer reflectors from 2.7 to 11.6 nm
- 著者名:
- Sandberg, R.L. ( Brigham Young Univ. (USA) )
- Allred, D.D. ( Brigham Young Univ. (USA) )
- Johnson, J.E. ( Brigham Young Univ. (USA) )
- Turley, R.S. ( Brigham Young Univ. (USA) )
- 掲載資料名:
- Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5193
- 発行年:
- 2004
- 開始ページ:
- 191
- 終了ページ:
- 203
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450661 [0819450669]
- 言語:
- 英語
- 請求記号:
- P63600/5193
- 資料種別:
- 国際会議録
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3
国際会議録
Removing Surface Contaminants from Silicon Wafers to Facilitate EUV Optical Characterization
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12
テクニカルペーパー
LONGITUDINAL STABILITY AND CONTROL DERIVATIVES OBTAINED FROM FLIGHT DATA OF A PA-30 AIRCRAFT Final Report
National Aeronautics and Space Administration |