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Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor

著者名:
掲載資料名:
Advanced materials forum II : proceedings of the II International Materials Symposium, Materiais 2003 and XI Encontro Sociedade Portugesa de Materiais - SPM, Campus da Caparica, April 14-16, Caparica, Portugal, 2003
シリーズ名:
Materials science forum
シリーズ巻号:
455-456
発行年:
2004
開始ページ:
25
終了ページ:
29
総ページ数:
5
出版情報:
Uetikon-Zuerich: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878499410 [0878499415]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

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