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Dry Oxidation Behavior of Epitaxial Si0.7Ge0.3 Films

著者名:
掲載資料名:
Designing, processing and properties of advanced engineering materials : proceedings of the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials, held in Jeju, Korea, November 5-8, 2003
シリーズ名:
Materials science forum
シリーズ巻号:
449-452
発行年:
2004
開始ページ:
361
終了ページ:
364
総ページ数:
4
出版情報:
Zuerich: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878499397 [0878499393]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

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