Temperature Dependence of Sublimation Growth of 6H-SiC on (11-20) Substrates

Temperature Dependence of Sublimation Growth of 6H-SiC on (11-20) Substrates

著者名:

掲載資料名:

Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001

シリーズ名:

Materials science forum

シリーズ巻号:

389-393

発行年:

2002

開始ページ:

119

終了ページ:

122

総ページ数:

4

出版情報:

Zuerich, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878498949 [087849894X]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013331
シリーズID:	PA00000012
会議名:	International Conference on Silicon Carbide and Related Materials
回次:	2001
会議開催地:	Tsukuba, Japan
会議開催年:	2001.10.28-2001.11.02

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1 国際会議録 Temperature Dependence of Sublimation Growth of 6H-SiC on (11-20) Substrates Nishiguchi, T., Masuda, Y., Ohshima, Satoru, Nishino, S. Trans Tech Publications	7 国際会議録 Crystal Growth of 6H-SiC(01-14) on 3C-SiC(001) Substrate by Sublimation Epitaxy Takagi, H., Nishiguchi, T., Ohta, S., Furusho, T., Ohshima, S., Nishino, S. Trans Tech Publications
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