Electron-beam mask repair with induced reactions

Electron-beam mask repair with induced reactions

著者名:

Koops, H.W.P. ( NaWoTec GmbH (Germany) )
Edinger, K. ( NaWoTec GmbH (Germany) )
Bihr, J. ( LEO Elektronenmikroskopie GmbH (Germany) )
Boegli, V.A. ( NaWoTec GmbH (Germany) )
Greiser, J. ( LEO Elektronenmikroskopie GmbH (Germany) )

掲載資料名:

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5148

発行年:

2003

開始ページ:

90

終了ページ:

97

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819450180 [0819450189]

言語:

英語

請求記号:

P63600/5148

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013133
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
回次:	2003 : 19th
会議開催地:	Sonthofen, Germany
会議開催年:	2003.01.13-2003.01.15

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1 国際会議録 Application of electron-beam-induced processes to mask repair Edinger, K., Boegli, V.A., Budach, M., Hoinkis, O., Weyrauch, B., Koops, H.W.P., Bihr, J., Greiser, J. SPIE-The International Society for Optical Engineering	7 国際会議録 Demonstration of damage-free mask repair using electron beam-induced processes Liang, T., Stivers, A.R., Penn, M., Bald, D., Sethi, C., Boegli, V., Budach, M., Edinger, K., Spies, P. SPIE - The International Society of Optical Engineering
2 国際会議録 Electron-beam-induced processes and their applicability to mask repair Boegli, V.A., Koops, H.W.P., Budach, M., Edinger, K., Hoinkis, O., Weyrauch, B., Becker, R., Schmidt, R., Kaya, A., … SPIE-The International Society for Optical Engineering	8 国際会議録 Application data of the electron beam based photomask repair tool MeRiT MG Ehrlich, C., Edinger, K., Boegli, V., Kuschnerus, P. SPIE - The International Society of Optical Engineering
3 国際会議録 A novel electron-beam-based photomask repair tool Edinger, K., Becht, H., Becker, R., Bert, V., Boegli, V.A., Budach, M., Gyhde, S., Guyot, J., Hofmann, T., Hoinkis, O., … SPIE - The International Society of Optical Engineering	9 国際会議録 Three-dimensional additive electron beam lithography Koops,H.W.P., Weber,M., Schossler,C., Kaja,A. SPIE-The International Society for Optical Engineering
4 国際会議録 Charged-particle-beam-induced processes and their applicability to mask repair for next-generation lithographies Koops,H.W.P. SPIE-The International Society for Optical Engineering	10 国際会議録 Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography Babin,S.V., Weber,M., Koops,H.W.P. SPIE-The International Society for Optical Engineering
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