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Performance of the aerial image measurement system for 157-nm lithography

著者名:
Kuschnerus, P. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Engel, T. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Harnisch, W. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Hertfelder, C. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Zibold, A.M. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Urbach, J.-P. ( International SEMATECH (USA) )
Schilz, C.M. ( Infineon Technologies AG (Germany) )
Eisner, K. ( Infineon Technologies AG (Germany) )
さらに 3 件
掲載資料名:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5148
発行年:
2003
開始ページ:
62
終了ページ:
70
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450180 [0819450189]
言語:
英語
請求記号:
P63600/5148
資料種別:
国際会議録

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