Low k1 lithography patterning option for the 90-nm and 65-nm nodes
- 著者名:
Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Shi, X. ( ASML MaskTools, Inc. (USA) ) Hsu, M. ( ASML MaskTools, Inc. (USA) ) Wampler, K.E. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Yu, A. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Yang, S.C. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 812
- 終了ページ:
- 828
- 総ページ数:
- 17
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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