Phase defect printability analysis for chromeless phase lithography technology
- 著者名:
Huh, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Park, J.H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chung, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, C.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 787
- 終了ページ:
- 795
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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