Pattern-dependence optical phase effect on alternating phase shift mask
- 著者名:
Chang, B.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) You, J.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lu, M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lee, C.-L. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Kung, L.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shu, K.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shin, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 745
- 終了ページ:
- 755
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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9
国際会議録
Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
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