Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM)
- 著者名:
Kotani, T. ( Toshiba Corp. (Japan) ) Ichikawa, H. ( Toshiba Microelectronics Corp. (Japan) ) Urakami, T. ( Toshiba Microelectronics Corp. (Japan) ) Nojima, S. ( Toshiba Corp. (Japan) ) Kobayashi, S. ( Toshiba Microelectronics Corp. (Japan) ) Oikawa, Y. ( Toshiba Corp. (Japan) ) Tanaka, S. ( Toshiba Corp. (Japan) ) Ikeuchi, A. ( Toshiba Microelectronics Corp. (Japan) ) Suzuki, K. ( Toshiba Corp. (Japan) ) Inoue, S. ( Toshiba Corp. (Japan) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 628
- 終了ページ:
- 637
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
7
国際会議録
Accurate proximity correction method with total-process proximity-based correction factor(TCF)
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
5
国際会議録
Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |