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Actinic aerial image measurement tool for 157-nm mask qualification

著者名:
Yasui, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Higashikawa, I. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kuschnerus, P. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Engel, T. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Zibold, A.M. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Hertfelder, C. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
Kobiyama, Y. ( Carl Zeiss Co., Ltd. (Japan) )
Urbach, J.-P. ( International SEMATECH (USA) )
Schilz, C.M. ( Infineon Technologies AG (Germany) )
Semmler, A. ( Infineon Technologies AG (Germany) )
さらに 5 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5130
発行年:
2003
開始ページ:
533
終了ページ:
544
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
言語:
英語
請求記号:
P63600/5130
資料種別:
国際会議録

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