Application of electron-beam-induced processes to mask repair

Application of electron-beam-induced processes to mask repair

著者名:

Edinger, K. ( NaWoTec GmbH (Germany) )

Boegli, V.A. ( NaWoTec GmbH (Germany) )

Budach, M. ( NaWoTec GmbH (Germany) )

Hoinkis, O. ( NaWoTec GmbH (Germany) )

Weyrauch, B. ( NaWoTec GmbH (Germany) )

Koops, H.W.P. ( NaWoTec GmbH (Germany) )

Bihr, J. ( LEO Elektronenmikroskopie GmbH (Germany) )

Greiser, J. ( LEO Elektronenmikroskopie GmbH (Germany) )

さらに 3 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5130

発行年:

2003

開始ページ:

383

終了ページ:

390

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

言語:

英語

請求記号:

P63600/5130

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013118
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2003 : 10th
会議開催地:	Yokohama, Japan
会議開催年:	2003.04.16-2003.04.18

類似資料:

1 国際会議録 Electron-beam-induced processes and their applicability to mask repair Boegli, V.A., Koops, H.W.P., Budach, M., Edinger, K., Hoinkis, O., Weyrauch, B., Becker, R., Schmidt, R., Kaya, A., … SPIE-The International Society for Optical Engineering	7 国際会議録 Application data of the electron beam based photomask repair tool MeRiT MG Ehrlich, C., Edinger, K., Boegli, V., Kuschnerus, P. SPIE - The International Society of Optical Engineering
2 国際会議録 Electron-beam mask repair with induced reactions Koops, H.W.P., Edinger, K., Bihr, J., Boegli, V.A., Greiser, J. SPIE-The International Society for Optical Engineering	8 国際会議録 Rapid prototyping and structure generation using three-dimensional nanolithography with electron-beam-induced chemical reactions Koops, H.W.P. SPIE-The International Society for Optical Engineering
3 国際会議録 A novel electron-beam-based photomask repair tool Edinger, K., Becht, H., Becker, R., Bert, V., Boegli, V.A., Budach, M., Gyhde, S., Guyot, J., Hofmann, T., Hoinkis, O., … SPIE - The International Society of Optical Engineering	9 国際会議録 Three-dimensional additive electron beam lithography Koops,H.W.P., Weber,M., Schossler,C., Kaja,A. SPIE-The International Society for Optical Engineering
4 国際会議録 Demonstration of damage-free mask repair using electron beam-induced processes Liang, T., Stivers, A.R., Penn, M., Bald, D., Sethi, C., Boegli, V., Budach, M., Edinger, K., Spies, P. SPIE - The International Society of Optical Engineering	10 国際会議録 Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography Babin,S.V., Weber,M., Koops,H.W.P. SPIE-The International Society for Optical Engineering
5 国際会議録 Charged-particle-beam-induced processes and their applicability to mask repair for next-generation lithographies Koops,H.W.P. SPIE-The International Society for Optical Engineering	11 国際会議録 Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography Koops,H.W.P., Babin,S.V., Weber,M., Dahm,G., Holopkin,A., Lyakhov,M.N. SPIE-The International Society for Optical Engineering
6 国際会議録 Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129] Edinger, K., Boegli, V., Degel, W. SPIE - The International Society of Optical Engineering	12 国際会議録 Advanced process capabilities for electron beam based photomask repair in a production environment A. Garetto, C. Baur, J. Oster, M. Waiblinger, K. Edinger Society of Photo-optical Instrumentation Engineers

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