New die-to-database inspection algorithm for inspection of 90-nm node reticles
- 著者名:
Garcia, H.I. ( KLA-Tencor Corp. (USA) ) Volk, W.W. ( KLA-Tencor Corp. (USA) ) Watson, S. ( KLA-Tencor Corp. (USA) ) Hess, C. ( KLA-Tencor Corp. (USA) ) Aquino, C. ( KLA-Tencor Corp. (USA) ) Wiley, J. ( KLA-Tencor Corp. (USA) ) Mack, C.A. ( KLA-Tencor Corp. (USA) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 364
- 終了ページ:
- 374
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Extending TeraStar reticle inspection capability to the 90nm node through layer-specific algorithms
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |