Advanced NLD mask dry etching system for 90-nm node technology

Advanced NLD mask dry etching system for 90-nm node technology

著者名:

Harashima, N. ( ULVAC Coating Corp. (Japan) )

Sasaki, T. ( ULVAC Coating Corp. (Japan) )

Kuwahara, K. ( ULVAC, Inc. (Japan) )

Hayashi, T. ( ULVAC, Inc. (Japan) )

Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Hara, M. ( HOYA Corp. (Japan) )

Ohkubo, Y. ( HOYA Corp. (Japan) )

さらに 3 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5130

発行年:

2003

開始ページ:

275

終了ページ:

280

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

言語:

英語

請求記号:

P63600/5130

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013118
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2003 : 10th
会議開催地:	Yokohama, Japan
会議開催年:	2003.04.16-2003.04.18

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2 国際会議録 Evaluation of loading effect of NLD dry etching: ？ Fujisawa,T., Iwamatsu,T., Hiruta,K., Morimoto,H., Harashima,N., Sasaki,T., Hara,M., Yamashiro,K., Ohkubo,Y., Takehana,Y. SPIE-The International Society for Optical Engineering	8 国際会議録 Advanced FIB mask repair technology for 100-nm/ArF lithography: II Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering
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